The method is based on procedures from electron beam lithography (EBL) but, in contrast to classic EBL, it can be applied by using widely available conventional SEM instruments that are not specifically tailored for EBL operation. This work describes a method for fabrication of extensive ordered arrays of microelectrodes with varied geometries, surrounded either by an insulating surface of poly(methyl methacrylate) (PMMA) or by a conductive material such as gold or glassy carbon (GC).
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